Influence of polymer wall formation on alignment behaviors of ferroelectric liquid crystal devices

Takeshi Murashige; Hideo Fujikake; Hiroto Sato; Hiroshi Kikuchi; Taiichiro Kurita; Fumio Sato

doi:10.2494/photopolymer.18.27

Influence of polymer wall formation on alignment behaviors of ferroelectric liquid crystal devices

Takeshi Murashige, Hideo Fujikake, Hiroto Sato, Hiroshi Kikuchi, Taiichiro Kurita, Fumio Sato

Research output: Contribution to journal › Article › peer-review

Abstract

We clarified that polymer networks generated in polymer wall formation increase a threshold voltage for switching of a ferroelectric liquid crystal (FLC) near the polymer walls, from electron/optical microscopy and electrooptic measurement of FLC/polymer composite films. The polymer walls were formed by ultraviolet light irradiation to an FLC/monomer solution through a photomask. The ultraviolet light spreading from the photomask formed the undesirable polymer networks near the polymer walls. The decrease in the light spreading angle and monomer concentration reduced the generation of the polymer networks, which improved the FLC switching behaviors with applied voltages.

Original language	English
Pages (from-to)	27-32
Number of pages	6
Journal	Journal of Photopolymer Science and Technology
Volume	18
Issue number	1
DOIs	https://doi.org/10.2494/photopolymer.18.27
Publication status	Published - 2005
Externally published	Yes

Keywords

Ferroelectric liquid crystal
Polymer network
Polymer wall formation
Threshold voltage

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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10.2494/photopolymer.18.27

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title = "Influence of polymer wall formation on alignment behaviors of ferroelectric liquid crystal devices",

abstract = "We clarified that polymer networks generated in polymer wall formation increase a threshold voltage for switching of a ferroelectric liquid crystal (FLC) near the polymer walls, from electron/optical microscopy and electrooptic measurement of FLC/polymer composite films. The polymer walls were formed by ultraviolet light irradiation to an FLC/monomer solution through a photomask. The ultraviolet light spreading from the photomask formed the undesirable polymer networks near the polymer walls. The decrease in the light spreading angle and monomer concentration reduced the generation of the polymer networks, which improved the FLC switching behaviors with applied voltages.",

keywords = "Ferroelectric liquid crystal, Polymer network, Polymer wall formation, Threshold voltage",

author = "Takeshi Murashige and Hideo Fujikake and Hiroto Sato and Hiroshi Kikuchi and Taiichiro Kurita and Fumio Sato",

year = "2005",

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language = "English",

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T1 - Influence of polymer wall formation on alignment behaviors of ferroelectric liquid crystal devices

AU - Murashige, Takeshi

AU - Fujikake, Hideo

AU - Sato, Hiroto

AU - Kikuchi, Hiroshi

AU - Kurita, Taiichiro

AU - Sato, Fumio

PY - 2005

Y1 - 2005

N2 - We clarified that polymer networks generated in polymer wall formation increase a threshold voltage for switching of a ferroelectric liquid crystal (FLC) near the polymer walls, from electron/optical microscopy and electrooptic measurement of FLC/polymer composite films. The polymer walls were formed by ultraviolet light irradiation to an FLC/monomer solution through a photomask. The ultraviolet light spreading from the photomask formed the undesirable polymer networks near the polymer walls. The decrease in the light spreading angle and monomer concentration reduced the generation of the polymer networks, which improved the FLC switching behaviors with applied voltages.

AB - We clarified that polymer networks generated in polymer wall formation increase a threshold voltage for switching of a ferroelectric liquid crystal (FLC) near the polymer walls, from electron/optical microscopy and electrooptic measurement of FLC/polymer composite films. The polymer walls were formed by ultraviolet light irradiation to an FLC/monomer solution through a photomask. The ultraviolet light spreading from the photomask formed the undesirable polymer networks near the polymer walls. The decrease in the light spreading angle and monomer concentration reduced the generation of the polymer networks, which improved the FLC switching behaviors with applied voltages.

KW - Ferroelectric liquid crystal

KW - Polymer network

KW - Polymer wall formation

KW - Threshold voltage

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Influence of polymer wall formation on alignment behaviors of ferroelectric liquid crystal devices

Abstract

Keywords

ASJC Scopus subject areas

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