Influence of local anisotropy fluctuation on soft magnetic properties of the sputtered fe-si-al alloy films

M. Takahashi, T. Shimatsu, H. Shoji, T. Wakiyama, N. Kato

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

Effective permeability, ueff, uniaxial anisotropy field, Hk, and local anisotropy fluctuation represented as magnetic ripple, SA -5/8, were systematically clarified as a function of Composition and film thickness for the le-Si-Al ternary alloy films. Influence of Hk and SA -5/8 on ueff was discussed in connection with the film structure. The magnitude of ueff was found to be strongly dependent on the magnitude of microscopical local anisotropy fluctuation. The decrease of the film thickness causes a remarkable increment in SA -5/8 due to the change of the preferred grain orientation from (110) to (110)+(100) texture. To realize excellent high ueff for Fe-Si-Al films in high frequency region, it is concluded that the homogeneous preferred grain orientation in the films is important.

Original languageEnglish
Pages (from-to)3084-3086
Number of pages3
JournalIEEE Transactions on Magnetics
Volume24
Issue number6
DOIs
Publication statusPublished - 1988 Nov

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Influence of local anisotropy fluctuation on soft magnetic properties of the sputtered fe-si-al alloy films'. Together they form a unique fingerprint.

Cite this