Influence of ion irradiation effects on the hydriding behavior of nanocrystalline Mg-Ni films

E. Wirth, D. Milcius, L. L. Pranevicius, D. Noreus, T. Sato, C. Templier

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Mg-Ni films were grown on a silicon substrate using two magnetron sputter deposition sources and simultaneous Ar ion irradiation. X-ray diffraction microstructure and phase composition, EDX elemental composition and atomic force microscopy surface topography analysis showed that under low-energy Ar ion irradiation (bias voltages from 0 to -120 V), the Mg2Ni phase was dominant and on the contrary with the increase of ion energy (bias voltages from -120 to -200 V), the MgNi2 phase appeared. The Mg content changed from 63 at% down to 42 at% in films grown under bias voltages of 0 and -200 V, respectively. During hydrogenation at 8 bar, 270 °C for 3 h, films with a dominant phase of Mg2Ni were transformed into Mg2NiH4. Hydrogen in MgNi2 films was mainly in interstitials and tended to form bubbles.

Original languageEnglish
Pages (from-to)1224-1228
Number of pages5
JournalVacuum
Volume81
Issue number10
DOIs
Publication statusPublished - 2007 Jun 15
Externally publishedYes

Keywords

  • Hydrogen storage
  • Magnetron deposition
  • Mg-Ni alloy
  • Thin film

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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    Wirth, E., Milcius, D., Pranevicius, L. L., Noreus, D., Sato, T., & Templier, C. (2007). Influence of ion irradiation effects on the hydriding behavior of nanocrystalline Mg-Ni films. Vacuum, 81(10), 1224-1228. https://doi.org/10.1016/j.vacuum.2007.01.027