Influence of gas adsorption at the interface on the exchange coupling field of Ni-Fe/25at%Ni-Mn/Ni-fe films

K. Uneyama, M. Tsunoda, Migaku Takahashi

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

-The influence of gas adsorption at the interface on the exchange coupling field was investigated for Ni-Fe 200 A / 25at%Ni-Mn 200 A / Ni-Fe 300 A trilayer films deposited on Si(lOO) substrate. When the interface between the lower Ni-Fe layer and the Ni-Mn layer was exposed to an atmosphere with leaking air, 5 x 10"8~ 2 x 10"6 Torr for 60 min, unidirectional anisotropy constant, J-4 at the both interfaces abruptly decreased at l x 10"7 Torr of exposed pressure and vanished at 2 x 10" Torr. The vanishing Jy was strongly correlated with disappearance of y -Ni-Mn phase verified by TEM observation. In order to clarify the gas species which adsorb on the Ni-Fe surface and suppress the formation of 7 -Ni-Mn phase on it, the exposure of the interface under various pure gas atmosphere ( N2, C>2, FbO) was examined. As a result, oxygen was confirmed to be the most probable gas element, and the surface oxidation of Ni-Fe layer was found to prevent the epitaxial growth of y -Ni-Mn grains on it

Original languageEnglish
Pages (from-to)3685-3687
Number of pages3
JournalIEEE Transactions on Magnetics
Volume33
Issue number5 PART 2
DOIs
Publication statusPublished - 1997 Dec 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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