Influence of film composition on the structure and dielectric properties of anodic films on Ti-W alloys

H. Habazaki, M. Uozumi, H. Konno, K. Shimizu, Shinji Nagata, K. Takayama, Y. Oda, P. Skeldon, G. E. Thompson

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36 Citations (Scopus)

Abstract

The influence of tungsten on an amorphous-to-crystalline transition, leading to formation of anatase, and dielectric properties is examined for anodic oxides on Ti-W alloys. The structural change, which occurs at voltages of ∼ 10 V on high-purity titanium, and provides sites for generation of high-pressure gas oxygen bubbles, is suppressed to progressively increased voltages by increasing tungsten content of the film. Phosphorus species, derived from the electrolyte, also hinder the change. The tungsten species are located in the inner ∼ 80% of the film thickness as result of the faster migration of Ti4+ ions relative to that of W6+ ions in the growing oxide. Although the reported permittivity of anodic tungsten oxide is higher than that of amorphous anodic titania, the permittivity of the films on alloys decreases gradually with increasing tungsten content.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume152
Issue number8
DOIs
Publication statusPublished - 2005 Oct 7

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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    Habazaki, H., Uozumi, M., Konno, H., Shimizu, K., Nagata, S., Takayama, K., Oda, Y., Skeldon, P., & Thompson, G. E. (2005). Influence of film composition on the structure and dielectric properties of anodic films on Ti-W alloys. Journal of the Electrochemical Society, 152(8). https://doi.org/10.1149/1.1940750