Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices

Migaku Takahashi

    Research output: Contribution to journalArticlepeer-review

    3 Citations (Scopus)

    Abstract

    The ultra clean sputtering process (UC-process) was introduced in the fabrication of thin film media and spin valve type Ni-Fe/25 at% Ni-Mn/Ni-Fe tri-layered films. As a result, the UC process enables the control of the fine structure of the thin films and resulted in excellent magnetic properties. This study demonstrates that the UC-process is superior to the normal process presently used and plays an important role for the thin film media and spin valve head fabrication.

    Original languageEnglish
    Pages (from-to)851-855
    Number of pages5
    JournalShinku/Journal of the Vacuum Society of Japan
    Volume41
    Issue number10
    DOIs
    Publication statusPublished - 1998 Oct

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces, Coatings and Films
    • Electrical and Electronic Engineering

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