Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices

Migaku Takahashi

doi:10.3131/jvsj.41.851

Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices

Migaku Takahashi

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

The ultra clean sputtering process (UC-process) was introduced in the fabrication of thin film media and spin valve type Ni-Fe/25 at% Ni-Mn/Ni-Fe tri-layered films. As a result, the UC process enables the control of the fine structure of the thin films and resulted in excellent magnetic properties. This study demonstrates that the UC-process is superior to the normal process presently used and plays an important role for the thin film media and spin valve head fabrication.

Original language	English
Pages (from-to)	851-855
Number of pages	5
Journal	Shinku/Journal of the Vacuum Society of Japan
Volume	41
Issue number	10
DOIs	https://doi.org/10.3131/jvsj.41.851
Publication status	Published - 1998 Oct

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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abstract = "The ultra clean sputtering process (UC-process) was introduced in the fabrication of thin film media and spin valve type Ni-Fe/25 at% Ni-Mn/Ni-Fe tri-layered films. As a result, the UC process enables the control of the fine structure of the thin films and resulted in excellent magnetic properties. This study demonstrates that the UC-process is superior to the normal process presently used and plays an important role for the thin film media and spin valve head fabrication.",

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Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices

Abstract

ASJC Scopus subject areas

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