Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices

Migaku Takahashi

doi:10.3131/jvsj.41.851

Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices

Migaku Takahashi

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

The ultra clean sputtering process (UC-process) was introduced in the fabrication of thin film media and spin valve type Ni-Fe/25 at% Ni-Mn/Ni-Fe tri-layered films. As a result, the UC process enables the control of the fine structure of the thin films and resulted in excellent magnetic properties. This study demonstrates that the UC-process is superior to the normal process presently used and plays an important role for the thin film media and spin valve head fabrication.

Original language	English
Pages (from-to)	851-855
Number of pages	5
Journal	Shinku/Journal of the Vacuum Society of Japan
Volume	41
Issue number	10
DOIs	https://doi.org/10.3131/jvsj.41.851
Publication status	Published - 1998 Oct

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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@article{eb3cee71825b4292ad8dad05f1178c57,

title = "Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices",

abstract = "The ultra clean sputtering process (UC-process) was introduced in the fabrication of thin film media and spin valve type Ni-Fe/25 at% Ni-Mn/Ni-Fe tri-layered films. As a result, the UC process enables the control of the fine structure of the thin films and resulted in excellent magnetic properties. This study demonstrates that the UC-process is superior to the normal process presently used and plays an important role for the thin film media and spin valve head fabrication.",

author = "Migaku Takahashi",

year = "1998",

month = oct,

doi = "10.3131/jvsj.41.851",

language = "English",

volume = "41",

pages = "851--855",

journal = "Shinku/Journal of the Vacuum Society of Japan",

issn = "0559-8516",

number = "10",

}

TY - JOUR

T1 - Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices

AU - Takahashi, Migaku

PY - 1998/10

Y1 - 1998/10

N2 - The ultra clean sputtering process (UC-process) was introduced in the fabrication of thin film media and spin valve type Ni-Fe/25 at% Ni-Mn/Ni-Fe tri-layered films. As a result, the UC process enables the control of the fine structure of the thin films and resulted in excellent magnetic properties. This study demonstrates that the UC-process is superior to the normal process presently used and plays an important role for the thin film media and spin valve head fabrication.

AB - The ultra clean sputtering process (UC-process) was introduced in the fabrication of thin film media and spin valve type Ni-Fe/25 at% Ni-Mn/Ni-Fe tri-layered films. As a result, the UC process enables the control of the fine structure of the thin films and resulted in excellent magnetic properties. This study demonstrates that the UC-process is superior to the normal process presently used and plays an important role for the thin film media and spin valve head fabrication.

UR - http://www.scopus.com/inward/record.url?scp=0032310618&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032310618&partnerID=8YFLogxK

U2 - 10.3131/jvsj.41.851

DO - 10.3131/jvsj.41.851

M3 - Article

AN - SCOPUS:0032310618

VL - 41

SP - 851

EP - 855

JO - Shinku/Journal of the Vacuum Society of Japan

JF - Shinku/Journal of the Vacuum Society of Japan

SN - 0559-8516

IS - 10

ER -