Influence of annealing temperature on the structure and surface morphology of titanium oxide thin film

Yaqi Hou, Daming Zhuang, Gong Zhang, Ming Zhao, Minsheng Wu

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The influence of the annealing temperature on the micro-structure and surface morphology of TiO2 thin film prepared by midfrequency alternative magnetron sputtering technique has been studied. The micro-structures and surface morphology were examined by XRD and AFM. The results showed that the TiO2 thin film sputtered at room temperature is amporphous. After annealing at lower temperatures (lower than 700 °C), anatase phase appeared in TiO2 thin film; the grain size of TiO2 changed a little. After annealing at higher temperatures (higher than 900°C), the structure of TiO2 thin film changed into rutile completely; the TiO2 changed from column to nubbly.

Original languageEnglish
Pages (from-to)247-251
Number of pages5
JournalZhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology
Volume22
Issue number4
Publication statusPublished - 2002 Aug

Keywords

  • Anatase
  • Mid-frequency alternative magnetron sputtering
  • Rutile
  • TiO thin film

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces

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