Influence of annealing temperature on optical properties of titanium oxide thin films

Yaqi Hou, Daming Zhuang, Gong Zhang, Ming Zhao, Minsheng Wu

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

The influence of annealing temperature on optical properties of TiO2 thin films prepared using the mid-frequency AC magnetron sputtering technique was studied to design TiO2 thin film annealing process. The transmittance and reflectance spectra of TiO2 thin films on fused silica substrate were measured by a spectrophotometer. The reflective indices of the films were calculated using the envelope method and the extinction coefficients were determined using the empirical formula method. The results show that the refractive index of the TiO2 thin films increases with annealing temperature while the film extinction coefficient decreases a little at lower annealing temperatures. The TiO2 thin film annealed at 500°C has the best optical properties.

Original languageEnglish
Pages (from-to)1441-1443
Number of pages3
JournalQinghua Daxue Xuebao/Journal of Tsinghua University
Volume43
Issue number11
Publication statusPublished - 2003 Nov

Keywords

  • Annealing
  • Mid-frequency AC magnetron sputtering
  • Thin film optics
  • Titanium oxide thin film

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint

Dive into the research topics of 'Influence of annealing temperature on optical properties of titanium oxide thin films'. Together they form a unique fingerprint.

Cite this