Induced uniaxial magnetic anisotropy and film magnetostriction in very thin permalloy films

H. Katada, T. Shimatsu, I. Watanabe, Hiroaki Muraoka, Y. Nakamura, Y. Sugita

Research output: Contribution to journalConference articlepeer-review

15 Citations (Scopus)


The induced uniaxial anisotropy field Hk in very thin films sandwiched by Ta or Cu layers was investigated. The value of Hk of the Ta/Cu/Ni79Fe21/Cu/Ta film decreases as film thickness decreases below 20 nm, even after an annealing procedure in a magnetic field. This Hk reduction is similar to that of the Ta/Ni79 Fe21/Ta films, indicating that the Hk reduction is independent of surface energy and/or crystal structure of seed layers. The value of film magnetostriction λp-p of the Ta/NiFe/Ta films gradually increases as the thickness decreases, which is coincident with the reduction of Hk. However, the increase of the λp-p values, by decreasing Ni concentration or annealing the films, resulted in conflicting Hk values. These results indicate that the Hk reduction in thin films is not simply caused by the magnetostrictive effect.

Original languageEnglish
Pages (from-to)2334-2336
Number of pages3
JournalIEEE Transactions on Magnetics
Issue number4 I
Publication statusPublished - 2001 Jul
Event8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag) - San Antonio, TX, United States
Duration: 2001 Jan 72001 Jan 11


  • Film magnetostriction
  • Induced uniaxial anisotropy field
  • Surface anisotropy
  • Very thin permalloy films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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