Increased UV sensitivity of Escherichia coli cells after introduction of foreign photolyase genes

Takayasu Kobayashi, Masashi Takao, Atsushi Oikawa, Akira Yasui

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

High-expression plasmids for photolyase (phr) genes from the bacteria Escherichia coli, Anacystis nidulans, Streptomyces griseus and Halobacterium halobium and the yeast Saccharomyces cerevisiae were constructed and introduced into E. coli phr recA cells. As previously reported, all introduced phr genes provided the host cells with photoreactivation-repair activity and the introduced E. coli phr gene rendered the host cells more UV-resistant in the dark. E. coli cells harboring foreign phr genes, however, were found to be more sensitive to UV light in the dark than cells containing the vector plasmid only. These differences in UV sensitivity in the dark disappeared when the host cells had an additional mutation, uvrA, suggesting that the foreign photolyases inhibited the E. coli excision-repair system.

Original languageEnglish
Pages (from-to)27-34
Number of pages8
JournalMutation Research-DNA Repair
Volume236
Issue number1
DOIs
Publication statusPublished - 1990 Jul

Keywords

  • Evolution
  • Excision repair
  • Photolyase

ASJC Scopus subject areas

  • Molecular Biology
  • Toxicology
  • Genetics

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