Increase of Ar+ ion density in argon RF magnetron discharges caused by the addition of a small amount of oxygen

Shigeru Yonemura, Kenichi Nanbu

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

Particle-in-cell/Monte Carlo (PIC/MC) simulations were performed for radio frequency (RF) planar magnetron discharges of pure argon gas and an O2-Ar gas mixture. The number densities of Ar+ and O- ions drastically increased when oxygen was added to the Ar discharge gas. Moreover, the spatial distributions of positive ions, Ar+, O2+, and O+, had two peaks in the O2/Ar mixture discharge. The positive ions were distributed in such a way that the charge neutrality was kept in the plasma bulk, indicating that the behavior of Ar+ ions is influenced by the existence of O-ions. The mechanism of this phenomenon is herein clearly explained by visualizing results of the simulation.

Original languageEnglish
Pages (from-to)350-351
Number of pages2
JournalIEEE Transactions on Plasma Science
Volume33
Issue number2 I
DOIs
Publication statusPublished - 2005 Apr 1

Keywords

  • Magnetron discharge
  • Oxygen/argon mixture
  • Particle-in-cell/Monte Carlo (PIC/MC) simulation
  • Radio frequency (RF)

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

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