Increase in the Efficiency of III-Nitride Micro-LEDs: Atomic-Layer Deposition and Etching

An Chen Liu, Konthoujam James Singh, Yu Ming Huang, Tanveer Ahmed, Fang Jyun Liou, Yu Hau Liou, Chao Cheng Ting, Chien Chung Lin, Yiming Li, Seiji Samukawa, Hao Chung Kuo

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

MICRO-LEDs ( n-LEDs) HAVE been engaged in the next-generation display technology and evolved for various applications from several electronics manufacturers and institutions. The area of n-LEDs (less than 10 # 10 nm2) is desired for the high pixelsper-inch (PPI) value of the microdisplay, but the sidewall effect from the etching process will drop the quantum efficiency

Original languageEnglish
Article number9398850
Pages (from-to)18-34
Number of pages17
JournalIEEE Nanotechnology Magazine
Volume15
Issue number3
DOIs
Publication statusPublished - 2021 Jun

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering

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