In-situ x-ray observation of molecular structure in organic thin films during evaporation process by total reflection in־plane x-ray diffractometer

Kouichi Hayashi, Kenji Ishida, Toshihisa Horiuchi, Kazumi Matsushige

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

The in-plane X-ray diffractometer equipped with a vacuum evaporation apparatus was newly developed utilizing the total reflection phenomenon. The measuring system was applied to conduct an in-situ observation of the crystal growth and structural changes in the n-C33H68 molecules during an evaporation process. The results revealed that a certain amount of molecules in the as-evaporated films orient their (010) planes parallel to the surface of the SiO2 substrate. Moreover, the integrated intensity of the 110 reflection showed variation in the thickness dependence, suggesting that the molecular orientation altered as the interaction between the substrate and the adsored molecules became weaker.

Original languageEnglish
Pages (from-to)4081-4085
Number of pages5
JournalJapanese journal of applied physics
Volume31
Issue number12 R
DOIs
Publication statusPublished - 1992 Dec

Keywords

  • Energy-dispersive x-ray diffraction
  • Evaporation
  • In-plane structure
  • In-situ observation
  • Molecular orientation
  • N-paraffin
  • Thin organic film
  • Total reflection

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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