A report on the in situ spectral control of Zn species during helicon wave excited plasma sputtering epitaxy (HWPSE) of ZnO was presented. The emission of sputtered plumes was introduced to a monochromator through a pure quartz viewport. It was found that the ZnO film formation have certain threshold V t (around -200 V at 600 °C), and the growth rate increased with the magnitude of Vt.
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)