In situ positioning of a few hundred micrometer-sized cleaved surfaces for soft-x-ray angle-resolved photoemission spectroscopy by use of an optical microscope

Takayuki Muro, Yukako Kato, Tomohiro Matsushita, Toyohiko Kinoshita, Yoshio Watanabe, Akira Sekiyama, Hiroshi Sugiyama, Masato Kimura, Satoshi Komori, Shigemasa Suga, Hiroyuki Okazaki, Takayoshi Yokoya

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    6 Citations (Scopus)

    Abstract

    A method to position samples with small cleaved regions has been developed to be applied to the angle-resolved photoemission spectroscopy (ARPES) which uses soft-x-ray synchrotron radiation focused down to 160×180 μ m 2. A long-working-distance optical microscope is used for the sample observation. A selected region on a sample can be optimally set at the position of measurements, which is realized by the spatial resolution of the photoelectron analyzer. Using this method, electronic band dispersions of bulk silicon have been measured by ARPES for a partially cleaved region with a size of ∼200×500 μ m2.

    Original languageEnglish
    Article number053901
    JournalReview of Scientific Instruments
    Volume80
    Issue number5
    DOIs
    Publication statusPublished - 2009

    ASJC Scopus subject areas

    • Instrumentation

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