In-situ photoluminescence, Raman, and IR spectral study of porous silicon during exposure to thermoelectrons/H atoms, /H2O and /O3

Toshimasa Wadayama, Tuyoshi Arigane, Aritada Hatta

Research output: Contribution to journalArticlepeer-review

Abstract

Photoluminescence (PL), Raman, and transmission IR spectral measurements of porous silicon (PS) have been carried out during exposure to thermoelectrons and also subsequent exposure to H atoms, H2O and O3. The PL band of as-anodized PS was significantly decreased by the first exposure to thermoelectrons accompanied by the intensity reduction of the IR bands due to hydrogenated Si species (Si-Hx; x = 1-3). Upon subsequent exposure to H atoms the PL band intensity was almost recovered but never exceeded its original intensity. This PL recovery was accompanied by re-generation of Si-Hx bonds. In contrast, an overshooting recovery in the PL intensity took place when thermoelectron-treated PS was exposed to H2O or O3. The obtained IR spectra showed that Si-O and/or Si-OH bonds were formed at the PS surface. These results demonstrate that the PL of the PS is quite sensitive to the oxygen-included surface bonds.

Original languageEnglish
Pages (from-to)1394-1399
Number of pages6
JournalMaterials Transactions
Volume44
Issue number7
DOIs
Publication statusPublished - 2003 Jul

Keywords

  • Infrared absorption spectroscopy
  • Photoluminescence
  • Porous silicon
  • Raman spectroscopy
  • Thermoelectron

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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