In situ observation of the complex scattering amplitude of x-ray specular reflection (amplitude reflectivity) was performed by using a method with a multiwave x-ray diffraction phenomenon. The method can be applied to the noncrystalline layers on a single crystal and allows us to determine its amplitude reflectivity with only a 0.01 degree of crystal rotation, that is, the area irradiated by the incident x rays is almost unchanged during the measurement. We used this method to observe an irradiation effect induced by monochromatic synchrotron x-rays that occurred on a Si(001) single crystal covered with a native oxide layer. The obtained time evolution of the amplitude reflectivities exhibited counterclockwise behavior in the complex plane, indicating that the thickness of the noncrystalline layer on the crystalline substrate was increased by the irradiation.
ASJC Scopus subject areas
- Physics and Astronomy(all)