In situ observation of deep UV patterning in polymer LB films by surface plasmon spectroscopy

Masaya Mitsuishi, Tiesheng Li, Tokuji Miyashita

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The paper describes in situ observation of the photopattern formation in polymer Langmuir-Blodgett (LB) film by surface plasmon spectroscopy. The copolymers (p(DDAABVPC)) of N-dodecylacrylamide (DDA) which is known to form a stable monolayer with a photo-degradable monomer, tert-butyl-4vinylphenyl carbonate (tBVPC), form a stable monolayer and LB film. When the copolymer LB films were irradiated by deep UV light in air, the photodecomposition took place, consequently the thickness in the LB film was gradually decreased. On the other hand, there were no significant changes in the thickness with the irradiation at the argon atmosphere. It was found that the molecular oxygen plays a decisive role in yielding the positive-tone pattern in the p(DDAABVPC) LB films.

Original languageEnglish
Pages (from-to)269-272
Number of pages4
JournalMolecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume370
DOIs
Publication statusPublished - 2001 Jan 1

Keywords

  • LB film
  • Pattern
  • Polymer
  • Surface plasmon

ASJC Scopus subject areas

  • Condensed Matter Physics

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