In situ observation of chemical vapour-deposited titanium oxide films by double-modulation infrared emission spectrometry

Toshimasa Wadayama, Hiroshi Mizuseki, Aritada Hatta

Research output: Contribution to journalArticle

Abstract

Double-modulation infrared emission spectrometry was applied to the in situ observation of titanium oxide films grown on gold substrates from a mixture of tetraisopropoxytitanium and oxygen under controlled gaseous pressure and substrate temperature. The emission band associated with the formation of TiO bonds shifts continuously towards higher frequencies with deposition time over the range 870-920 cm-1. Structures of the films are discussed through a comparison between the observed and calculated emission spectra and by x-ray diffraction analysis. It was found that the film growth is relatively slow in the early stage of the deposition. Further, it is shown that UV illumination facilitates the growth of the film. Some possibilities for this origin are discussed.

Original languageEnglish
Pages (from-to)239-244
Number of pages6
JournalAnalytica Chimica Acta
Volume253
Issue number4
Publication statusPublished - 1991 Dec 12

Keywords

  • Chemical vapour deposition
  • Double modulation
  • Infrared spectrometry
  • Titanium oxide films

ASJC Scopus subject areas

  • Analytical Chemistry
  • Biochemistry
  • Environmental Chemistry
  • Spectroscopy

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