Abstract
In situ observation by photoelectron spectroscopy using synchrotron radiation was performed to investigate the species and coverage of surface adsorbates while exposing the high-temperature Si(001) surface to SiH2Cl2 atmosphere. Photoelectron spectra of valence bands made it possible to evaluate the clean surface area with dimer dangling bonds (Si-db). Curve-fitting analysis of Si 2p spectra showed that the chlorine adsorption species is only monochloride (Si-Cl) in the whole temperature region from room temperature to ∼ 700°C examined. From comparison between the surface coverages of Si-db and Si-Cl in connection with the 2 × 1 structure of the SiH2Cl2-adsorbed Si(001) surface as observed by reflection high energy electron diffraction, we assigned the hydrogen adsorption state to be dominantly monohydride (Si-H). The temperature dependencies of the surface coverages obtained for Si-Cl, Si-H and Si-db are discussed using a surface reaction model of SiH2Cl2 adsorption.
Original language | English |
---|---|
Pages (from-to) | 354-360 |
Number of pages | 7 |
Journal | Thin Solid Films |
Volume | 343-344 |
Issue number | 1-2 |
DOIs | |
Publication status | Published - 1999 Jan 1 |
Keywords
- Adsorption
- Desorption
- In situ observation
- Photoelectron spectroscopy
- Si(001)
- SiHCl
- Synchrotron radiation
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry