In situ IR spectroscopic study of a-Si:H films growing under photo-chemical vapor deposition condition

Toshimasa Wadayama, Wataru Suëtaka

Research output: Contribution to journalArticle

45 Citations (Scopus)

Abstract

Polarization modulation infrared spectroscopy has been successfully applied for in situ observations of a-Si:Hfilms growing under photo-chemical vapor deposition conditions. The thin films exhibited absorption bands arising fromSiH3or SiH2species, depending upon the substrate temperature. Whereas the mass thickness of thefilm deposited at 293 K increased in proportion to the deposition time, the IR absorption intensity of SiH3species decreased in rate when the film grew beyond 15 Å in thickness, showing that the concentration of the SiH3species becomes reduced with the deposition time. Although the band ascribable to the Si-O stretching vibration could not be observed during the deposition, it grew when the film was exposed to air. This fact suggests that theorigin of the oxygen incorporated in the film is mainly atmospheric oxidizing agents.

Original languageEnglish
Pages (from-to)501-505
Number of pages5
JournalJapanese journal of applied physics
Volume27
Issue number4R
DOIs
Publication statusPublished - 1988 Apr

Keywords

  • A-Si:H
  • Behavior of hydrogenated silicon species
  • In situ observation
  • Photo-CVD
  • Polarization modulation IR spectroscopy

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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