In-situ IR and mass spectroscopic study of the Al(CH 3 ) 2 H/a-Si:H reaction processes

T. Wadayama, Y. Maiwa, H. Shibata, A. Hatta

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6 Citations (Scopus)

Abstract

The reaction of dimethylaluminum hydride (DMAH) with photochemically deposited hydrogenated amorphous silicon (a-Si:H) has been studied in-situ with polarization modulation IR and quadruple mass spectroscopy. Under UV illumination, IR absorption bands due to hydrogenated silicon species incorporated in the a-Si:H decrease in intensity upon exposure to DMAH at 323-593 K. Between 323 and 473 K, the bands due to SiH 3 species completely disappear by the exposure of DMAH while those of SiH 2 species remain nearly unchanged. The intensities of the SiH 2 bands begin to decrease above 473 K. These spectral changes caused by DMAH exposure are observed only in the early stages with marked evolution of H 2 and CH 4 . These results suggest that DMAH reacts with SiH 3 species at the outermost surface of the a-Si:H.

Original languageEnglish
Pages (from-to)575-578
Number of pages4
JournalApplied Surface Science
Volume100-101
DOIs
Publication statusPublished - 1996 Jul

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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