In situ infrared study of chemical state of Si surface in etching solution

Michio Niwano, Yasuo Kimura, Nobuo Miyamoto

Research output: Contribution to journalArticlepeer-review

28 Citations (Scopus)

Abstract

We have]] in situ" investigated the chemistry of Si(100) surfaces during immersion in hydrofluoric acid (HF) solution, using infrared spectroscopy in the multiple internal reflection geometry. During immersion in dilute HF solution, hydrogen termination is not completed and hydrogen-associated Si fluorides may be generated on the surface. We demonstrate that water rinse following treatment with HF solution leads to the complete hydrogen termination of Si surfaces.

Original languageEnglish
Pages (from-to)1692-1694
Number of pages3
JournalApplied Physics Letters
Volume65
Issue number13
DOIs
Publication statusPublished - 1994 Dec 1

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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