In situ growth monitoring during metalorganic chemical vapor deposition of YBa2Cu3Ox thin films by spectroscopic ellipsometry

Shuu'ichirou Yamamoto, Satoshi Sugai, Yasunari Matsukawa, Akio Sengoku, Hiroshi Tobisaka, Takeo Hattori, Shunri Oda

    Research output: Contribution to journalArticle

    5 Citations (Scopus)

    Abstract

    We have investigated in situ spectroscopic ellipsometry in the case of atomic layer-by-layer metalorganic chemical vapor deposition of YBa2Cu3Ox (YBCO) thin films. We have demonstrated the effectiveness of spectroscopic measurement from the relationship between the film properties and trajectories of the pseudodielectric function of YBCO thin films deposited on SrTiO3 substrates. We have also demonstrated, in detail, how high-quality crystalline YBCO, formed in the initial growth stage, can be obtained from the imaginary part of the pseudodielectric function around 4.1 eV. Superconductivity of YBCO films can be estimated during film deposition using optical measurements.

    Original languageEnglish
    JournalJapanese Journal of Applied Physics, Part 2: Letters
    Volume38
    Issue number6 A/B
    Publication statusPublished - 1999 Jun 15

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy (miscellaneous)
    • Physics and Astronomy(all)

    Fingerprint Dive into the research topics of 'In situ growth monitoring during metalorganic chemical vapor deposition of YBa<sub>2</sub>Cu<sub>3</sub>O<sub>x</sub> thin films by spectroscopic ellipsometry'. Together they form a unique fingerprint.

  • Cite this