In-situ doping of epitaxial silicon by low-temperature LPCVD for the fabrication of delta-doped MOSFETs

R. Kircher, J. Murota, M. Furuno, K. Aizawa, M. Kato, A. Horinouchi, S. Ono

Research output: Contribution to conferencePaperpeer-review

2 Citations (Scopus)

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Engineering & Materials Science