In-situ chemical vapor deposition of alumina catalyst bed on a suspended membrane microreactor

Tomokazu Takahashi; Shuji Tanaka; Kuei Sung Chang; Masayoshi Esashi

doi:10.1109/SENSOR.2005.1496563

In-situ chemical vapor deposition of alumina catalyst bed on a suspended membrane microreactor

Tomokazu Takahashi, Shuji Tanaka, Kuei Sung Chang, Masayoshi Esashi

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

This paper describes in-situ chemical vapor deposition (CVD) method to deposit alumna catalyst bed selectively on the suspended membrane of a microreactor. The microreactor with suspended membrane structure can realize good thermal isolation of the reaction area on the membrane, because heat conduction through the thin suspended membrane is quite small. However, it is difficult to form catalyst selectively on the suspended membrane. The solution can be given by the in-situ CVD method, by which alumina is deposited from alumina precursor selectively on the suspended membrane heated by integrated micro-heaters. We fabricated the suspended-membrane microreactors, and set up an in-situ CVD system using aluminum tri-isopropoxide (Al[(CH₃) ₂CHO]₃) as the precursor. Preliminary deposition tests were preformed. The deposits were observed using a scanning electron microscope (SEM), and the composition of the deposits was analyzed by energy dispersive spectroscopy (EDX).

Original language	English
Title of host publication	TRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers
Pages	899-903
Number of pages	5
DOIs	https://doi.org/10.1109/SENSOR.2005.1496563
Publication status	Published - 2005 Nov 9
Event	13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05 - Seoul, Korea, Republic of Duration: 2005 Jun 5 → 2005 Jun 9

Publication series

Name	Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05
Volume	1

Other

Other	13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05
Country	Korea, Republic of
City	Seoul
Period	05/6/5 → 05/6/9

Keywords

Alumina
Catalyst bed
Chemical vapor deposition
Micro-fuel reformer
Suspended membrane

ASJC Scopus subject areas

Engineering(all)

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Takahashi, T., Tanaka, S., Chang, K. S., & Esashi, M. (2005). In-situ chemical vapor deposition of alumina catalyst bed on a suspended membrane microreactor. In TRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers (pp. 899-903). [2E4.112] (Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05; Vol. 1). https://doi.org/10.1109/SENSOR.2005.1496563

In-situ chemical vapor deposition of alumina catalyst bed on a suspended membrane microreactor. / Takahashi, Tomokazu; Tanaka, Shuji; Chang, Kuei Sung; Esashi, Masayoshi.

TRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers. 2005. p. 899-903 2E4.112 (Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05; Vol. 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Takahashi, T, Tanaka, S, Chang, KS & Esashi, M 2005, In-situ chemical vapor deposition of alumina catalyst bed on a suspended membrane microreactor. in TRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers., 2E4.112, Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05, vol. 1, pp. 899-903, 13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05, Seoul, Korea, Republic of, 05/6/5. https://doi.org/10.1109/SENSOR.2005.1496563

Takahashi T, Tanaka S, Chang KS, Esashi M. In-situ chemical vapor deposition of alumina catalyst bed on a suspended membrane microreactor. In TRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers. 2005. p. 899-903. 2E4.112. (Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05). https://doi.org/10.1109/SENSOR.2005.1496563

Takahashi, Tomokazu ; Tanaka, Shuji ; Chang, Kuei Sung ; Esashi, Masayoshi. / In-situ chemical vapor deposition of alumina catalyst bed on a suspended membrane microreactor. TRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers. 2005. pp. 899-903 (Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05).

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AB - This paper describes in-situ chemical vapor deposition (CVD) method to deposit alumna catalyst bed selectively on the suspended membrane of a microreactor. The microreactor with suspended membrane structure can realize good thermal isolation of the reaction area on the membrane, because heat conduction through the thin suspended membrane is quite small. However, it is difficult to form catalyst selectively on the suspended membrane. The solution can be given by the in-situ CVD method, by which alumina is deposited from alumina precursor selectively on the suspended membrane heated by integrated micro-heaters. We fabricated the suspended-membrane microreactors, and set up an in-situ CVD system using aluminum tri-isopropoxide (Al[(CH3) 2CHO]3) as the precursor. Preliminary deposition tests were preformed. The deposits were observed using a scanning electron microscope (SEM), and the composition of the deposits was analyzed by energy dispersive spectroscopy (EDX).

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