In situ chemical state analysis of buried polymer/metal adhesive interface by hard X-ray photoelectron spectroscopy

Kenichi Ozawa; Takashi Kakubo; Katsunori Shimizu; Naoya Amino; Kazuhiko Mase; Eiji Ikenaga; Tetsuya Nakamura; Toyohiko Kinoshita; Hiroshi Oji

doi:10.1016/j.apsusc.2014.09.012

In situ chemical state analysis of buried polymer/metal adhesive interface by hard X-ray photoelectron spectroscopy

Kenichi Ozawa, Takashi Kakubo, Katsunori Shimizu, Naoya Amino, Kazuhiko Mase, Eiji Ikenaga, Tetsuya Nakamura, Toyohiko Kinoshita, Hiroshi Oji

Collaborative Research Division of Non-ferrousMetallurgy and Environmental Science

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

Chemical state analysis of adhesive interfaces is important to understand an adhesion mechanism between two different materials. Although photoelectron spectroscopy (PES) is an ideal tool for such an analysis, the adhesive interfaces must be exposed to the surface because PES is essentially a surface sensitive technique. However, an in situ observation is possible by hard X-ray PES (HAXPES) owing to its large probing depth. In the present study, HAXPES is applied to investigate the adhesive interface between rubber and brass without exposing the interface. It is demonstrated that copper sulfides formed at the buried rubber/brass interface are distinguished from S-containing species in the rubber overlayer. The chemical state of the buried interface is compared with that of the "exposed" interface prepared by so-called a filter-paper method.

Original language	English
Pages (from-to)	177-182
Number of pages	6
Journal	Applied Surface Science
Volume	320
DOIs	https://doi.org/10.1016/j.apsusc.2014.09.012
Publication status	Published - 2014 Nov 30

Keywords

Adhesion
Brass
Buried interface
HAXPES
Rubber

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

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In situ chemical state analysis of buried polymer/metal adhesive interface by hard X-ray photoelectron spectroscopy. / Ozawa, Kenichi; Kakubo, Takashi; Shimizu, Katsunori; Amino, Naoya; Mase, Kazuhiko; Ikenaga, Eiji; Nakamura, Tetsuya; Kinoshita, Toyohiko; Oji, Hiroshi.

In: Applied Surface Science, Vol. 320, 30.11.2014, p. 177-182.

Research output: Contribution to journal › Article › peer-review

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AU - Mase, Kazuhiko

AU - Ikenaga, Eiji

AU - Nakamura, Tetsuya

AU - Kinoshita, Toyohiko

AU - Oji, Hiroshi

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