In situ chemical state analysis of buried polymer/metal adhesive interface by hard X-ray photoelectron spectroscopy

Kenichi Ozawa, Takashi Kakubo, Katsunori Shimizu, Naoya Amino, Kazuhiko Mase, Eiji Ikenaga, Tetsuya Nakamura, Toyohiko Kinoshita, Hiroshi Oji

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

Chemical state analysis of adhesive interfaces is important to understand an adhesion mechanism between two different materials. Although photoelectron spectroscopy (PES) is an ideal tool for such an analysis, the adhesive interfaces must be exposed to the surface because PES is essentially a surface sensitive technique. However, an in situ observation is possible by hard X-ray PES (HAXPES) owing to its large probing depth. In the present study, HAXPES is applied to investigate the adhesive interface between rubber and brass without exposing the interface. It is demonstrated that copper sulfides formed at the buried rubber/brass interface are distinguished from S-containing species in the rubber overlayer. The chemical state of the buried interface is compared with that of the "exposed" interface prepared by so-called a filter-paper method.

Original languageEnglish
Pages (from-to)177-182
Number of pages6
JournalApplied Surface Science
Volume320
DOIs
Publication statusPublished - 2014 Nov 30

Keywords

  • Adhesion
  • Brass
  • Buried interface
  • HAXPES
  • Rubber

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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