Impurity measurement in specialty gases using an atmospheric pressure ionization mass spectrometer with a two-compartment ion source

Masafumi Kitano; Yasuyuki Shirai; Atsushi Ohki; Shinichi Babasaki; Tadahiro Ohmi

Impurity measurement in specialty gases using an atmospheric pressure ionization mass spectrometer with a two-compartment ion source

Masafumi Kitano, Yasuyuki Shirai, Atsushi Ohki, Shinichi Babasaki, Tadahiro Ohmi

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Using an atmospheric pressure ionization mass spectrometer (APIMS) with a two-compartment ion source, impurity in specialty gases (CH₄, SiH₄, GeH₄) is measured due to a stable ionization reaction with a detection limit of approximately 0.1 to 1 parts per billion (ppb). The form in which the impurity exists in these gases has been clarified. In the case of SiH₄, the main impurity is disiloxane (SiH₃-O-SiH₃). We have also established a method for obtaining the SiH₃-O-SiH₃ calibration curve standardized for a known concentration of SiH₃-O-SiH₃ generated from the reaction of SiH₄ with H₂O. In the case of CH₄ and GeH₄, the main impurity is moisture (H₂O) and it is quantified from the plotted H₂O calibration curve.

Original language	English
Pages (from-to)	2688-2693
Number of pages	6
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	40
Issue number	4 B
Publication status	Published - 2001 Apr 1

Keywords

APIMS
Calibration curve
Impurity
Ion-molecule reaction
Specialty gases

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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Impurity measurement in specialty gases using an atmospheric pressure ionization mass spectrometer with a two-compartment ion source. / Kitano, Masafumi; Shirai, Yasuyuki; Ohki, Atsushi; Babasaki, Shinichi; Ohmi, Tadahiro.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 40, No. 4 B, 01.04.2001, p. 2688-2693.

Research output: Contribution to journal › Article › peer-review

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abstract = "Using an atmospheric pressure ionization mass spectrometer (APIMS) with a two-compartment ion source, impurity in specialty gases (CH4, SiH4, GeH4) is measured due to a stable ionization reaction with a detection limit of approximately 0.1 to 1 parts per billion (ppb). The form in which the impurity exists in these gases has been clarified. In the case of SiH4, the main impurity is disiloxane (SiH3-O-SiH3). We have also established a method for obtaining the SiH3-O-SiH3 calibration curve standardized for a known concentration of SiH3-O-SiH3 generated from the reaction of SiH4 with H2O. In the case of CH4 and GeH4, the main impurity is moisture (H2O) and it is quantified from the plotted H2O calibration curve.",

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AU - Shirai, Yasuyuki

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AU - Babasaki, Shinichi

AU - Ohmi, Tadahiro

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AB - Using an atmospheric pressure ionization mass spectrometer (APIMS) with a two-compartment ion source, impurity in specialty gases (CH4, SiH4, GeH4) is measured due to a stable ionization reaction with a detection limit of approximately 0.1 to 1 parts per billion (ppb). The form in which the impurity exists in these gases has been clarified. In the case of SiH4, the main impurity is disiloxane (SiH3-O-SiH3). We have also established a method for obtaining the SiH3-O-SiH3 calibration curve standardized for a known concentration of SiH3-O-SiH3 generated from the reaction of SiH4 with H2O. In the case of CH4 and GeH4, the main impurity is moisture (H2O) and it is quantified from the plotted H2O calibration curve.

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