Improvement of zone control induction heating equipment for high-speed processing of semiconductor devices

Daisuke Miyagi; Aisya Saitou; Norio Takahashi; Naoki Uchida; Kazuhiro Ozaki

doi:10.1109/TMAG.2005.860823

Improvement of zone control induction heating equipment for high-speed processing of semiconductor devices

Daisuke Miyagi, Aisya Saitou, Norio Takahashi, Naoki Uchida, Kazuhiro Ozaki

ENG - Electrical Engineering

Research output: Contribution to journal › Article › peer-review

36 Citations (Scopus)

Abstract

In order to process a semiconductor device of high quality, uniform heating is necessary, but it is not easy to heat uniformly with conventional induction heating equipment. To solve this problem, zone control induction heating equipment has been jointly developed. In this paper, we examine the effect of dividing an induction heater into several small coil groups having different current and frequency, using the finite-element method. We describe the heating characteristics of the zone control coil groups and show that nearly uniform heating is possible by controlling both current and frequency.

Original language	English
Pages (from-to)	292-294
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	42
Issue number	2
DOIs	https://doi.org/10.1109/TMAG.2005.860823
Publication status	Published - 2006 Feb

Keywords

Induction heating
Uniform heating
Zone control

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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abstract = "In order to process a semiconductor device of high quality, uniform heating is necessary, but it is not easy to heat uniformly with conventional induction heating equipment. To solve this problem, zone control induction heating equipment has been jointly developed. In this paper, we examine the effect of dividing an induction heater into several small coil groups having different current and frequency, using the finite-element method. We describe the heating characteristics of the zone control coil groups and show that nearly uniform heating is possible by controlling both current and frequency.",

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AU - Uchida, Naoki

AU - Ozaki, Kazuhiro

PY - 2006/2

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N2 - In order to process a semiconductor device of high quality, uniform heating is necessary, but it is not easy to heat uniformly with conventional induction heating equipment. To solve this problem, zone control induction heating equipment has been jointly developed. In this paper, we examine the effect of dividing an induction heater into several small coil groups having different current and frequency, using the finite-element method. We describe the heating characteristics of the zone control coil groups and show that nearly uniform heating is possible by controlling both current and frequency.

AB - In order to process a semiconductor device of high quality, uniform heating is necessary, but it is not easy to heat uniformly with conventional induction heating equipment. To solve this problem, zone control induction heating equipment has been jointly developed. In this paper, we examine the effect of dividing an induction heater into several small coil groups having different current and frequency, using the finite-element method. We describe the heating characteristics of the zone control coil groups and show that nearly uniform heating is possible by controlling both current and frequency.

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KW - Uniform heating

KW - Zone control

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