Improvement of magnetic and R/W properties in longitudinal media by using CrX/Cr dual underlayer

D. D. Djayaprawira; A. Horii; K. Komiyama; S. Yoshimura; M. Mikami; H. Domon; M. Takahashi

doi:10.1109/20.950882

Improvement of magnetic and R/W properties in longitudinal media by using CrX/Cr dual underlayer

D. D. Djayaprawira, A. Horii, K. Komiyama, S. Yoshimura, M. Mikami, H. Domon, M. Takahashi

Research output: Contribution to journal › Conference article › peer-review

9 Citations (Scopus)

Abstract

The effect of in-plane lattice matching on the magnetic and read/write properties has been quantitatively studied in CoCr₂₄Pt₁₂B₄ or CoCr₂₀Pt₈Ta₄ media grown on Cr, CrMo₂₀ and CrMo₂₀/Cr underlayer. It is found that by using CrMo₂₀ (5 nm)/Cr (5 nm) dual underlayer, significant improvement of magnetic and R/W properties are realized. It is clarified that: (1) the utilization of CrMo/Cr dual underlayer increases H_C mainly due to the improvement of in-plane crystallographic orientation; (2) the lattice misfit has small effect on the improvement of in-plane crystallographic orientation. The improvement of in-plane crystallographic orientation by using CrX/Cr dual underlayer is suggested to be due to lattice strain at the interface of Cr and CrX underlayer, which enhances the grain growth of the magnetic layer.

Original language	English
Pages (from-to)	1497-1499
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	37
Issue number	4 I
DOIs	https://doi.org/10.1109/20.950882
Publication status	Published - 2001 Jul
Externally published	Yes
Event	8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag) - San Antonio, TX, United States Duration: 2001 Jan 7 → 2001 Jan 11

Keywords

Dual underlayer
In-plane XRD
Lattice misfit
Longitudinal media
Thin film

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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10.1109/20.950882

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title = "Improvement of magnetic and R/W properties in longitudinal media by using CrX/Cr dual underlayer",

abstract = "The effect of in-plane lattice matching on the magnetic and read/write properties has been quantitatively studied in CoCr24Pt12B4 or CoCr20Pt8Ta4 media grown on Cr, CrMo20 and CrMo20/Cr underlayer. It is found that by using CrMo20 (5 nm)/Cr (5 nm) dual underlayer, significant improvement of magnetic and R/W properties are realized. It is clarified that: (1) the utilization of CrMo/Cr dual underlayer increases HC mainly due to the improvement of in-plane crystallographic orientation; (2) the lattice misfit has small effect on the improvement of in-plane crystallographic orientation. The improvement of in-plane crystallographic orientation by using CrX/Cr dual underlayer is suggested to be due to lattice strain at the interface of Cr and CrX underlayer, which enhances the grain growth of the magnetic layer.",

keywords = "Dual underlayer, In-plane XRD, Lattice misfit, Longitudinal media, Thin film",

author = "Djayaprawira, {D. D.} and A. Horii and K. Komiyama and S. Yoshimura and M. Mikami and H. Domon and M. Takahashi",

note = "Funding Information: Manuscript received October 13, 2000. This work was supported in part by the Storage Research Consortium, the ASET program (NEDO) and Regional Consortium Project (NEDO) of Japan. D. D. Djayaprawira is with the Department of Electronic Engineering, Tohoku University, 05 Aobayama, Sendai 980-8579, Japan (e-mail: david@ecei.tohoku.ac.jp). Publisher Item Identifier S 0018-9464(01)06509-8.; 8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag) ; Conference date: 07-01-2001 Through 11-01-2001",

year = "2001",

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doi = "10.1109/20.950882",

language = "English",

volume = "37",

pages = "1497--1499",

journal = "IEEE Transactions on Magnetics",

issn = "0018-9464",

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T1 - Improvement of magnetic and R/W properties in longitudinal media by using CrX/Cr dual underlayer

AU - Djayaprawira, D. D.

AU - Horii, A.

AU - Komiyama, K.

AU - Yoshimura, S.

AU - Mikami, M.

AU - Domon, H.

AU - Takahashi, M.

N1 - Funding Information: Manuscript received October 13, 2000. This work was supported in part by the Storage Research Consortium, the ASET program (NEDO) and Regional Consortium Project (NEDO) of Japan. D. D. Djayaprawira is with the Department of Electronic Engineering, Tohoku University, 05 Aobayama, Sendai 980-8579, Japan (e-mail: david@ecei.tohoku.ac.jp). Publisher Item Identifier S 0018-9464(01)06509-8.

PY - 2001/7

Y1 - 2001/7

N2 - The effect of in-plane lattice matching on the magnetic and read/write properties has been quantitatively studied in CoCr24Pt12B4 or CoCr20Pt8Ta4 media grown on Cr, CrMo20 and CrMo20/Cr underlayer. It is found that by using CrMo20 (5 nm)/Cr (5 nm) dual underlayer, significant improvement of magnetic and R/W properties are realized. It is clarified that: (1) the utilization of CrMo/Cr dual underlayer increases HC mainly due to the improvement of in-plane crystallographic orientation; (2) the lattice misfit has small effect on the improvement of in-plane crystallographic orientation. The improvement of in-plane crystallographic orientation by using CrX/Cr dual underlayer is suggested to be due to lattice strain at the interface of Cr and CrX underlayer, which enhances the grain growth of the magnetic layer.

AB - The effect of in-plane lattice matching on the magnetic and read/write properties has been quantitatively studied in CoCr24Pt12B4 or CoCr20Pt8Ta4 media grown on Cr, CrMo20 and CrMo20/Cr underlayer. It is found that by using CrMo20 (5 nm)/Cr (5 nm) dual underlayer, significant improvement of magnetic and R/W properties are realized. It is clarified that: (1) the utilization of CrMo/Cr dual underlayer increases HC mainly due to the improvement of in-plane crystallographic orientation; (2) the lattice misfit has small effect on the improvement of in-plane crystallographic orientation. The improvement of in-plane crystallographic orientation by using CrX/Cr dual underlayer is suggested to be due to lattice strain at the interface of Cr and CrX underlayer, which enhances the grain growth of the magnetic layer.

KW - Dual underlayer

KW - In-plane XRD

KW - Lattice misfit

KW - Longitudinal media

KW - Thin film

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T2 - 8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag)

Y2 - 7 January 2001 through 11 January 2001

ER -

Improvement of magnetic and R/W properties in longitudinal media by using CrX/Cr dual underlayer

Abstract

Keywords

ASJC Scopus subject areas

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