Improvement of epitaxial channel quality on heavily arsenic- and boron-doped Si surfaces and impact on tunnel FET performance

Y. Morita; T. Mori; S. Migita; W. Mizubayashi; K. Fukuda; T. Matsukawa; K. Endo; S. O'Uchi; Y. X. Liu; M. Masahara; H. Ota

doi:10.1109/ESSDERC.2014.6948790

Improvement of epitaxial channel quality on heavily arsenic- and boron-doped Si surfaces and impact on tunnel FET performance

Y. Morita, T. Mori, S. Migita, W. Mizubayashi, K. Fukuda, T. Matsukawa, K. Endo, S. O'Uchi, Y. X. Liu, M. Masahara, H. Ota

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We evaluate the impact of tunnel junction quality on the performance of tunnel field-effect transistors (TFETs). Performing a sequential surface cleaning procedure prior to epitaxial channel growth for heavily arsenic- and boron-doped Si surfaces improves the interface quality both for p- and n-TFETs. Simultaneously, the subthreshold swing (SS) values of the TFETs improve step-by-step with interface quality.

Original language	English
Title of host publication	European Solid-State Device Research Conference
Editors	Roberto Bez, Gaudenzio Meneghesso, Paolo Pavan
Publisher	IEEE Computer Society
Pages	182-185
Number of pages	4
ISBN (Electronic)	9781479943784
DOIs	https://doi.org/10.1109/ESSDERC.2014.6948790
Publication status	Published - 2014 Nov 5
Externally published	Yes
Event	44th European Solid-State Device Research Conference, ESSDERC 2014 - Venezia Lido, Italy Duration: 2014 Sep 22 → 2014 Sep 26

Publication series

Name	European Solid-State Device Research Conference
ISSN (Print)	1930-8876

Other

Other	44th European Solid-State Device Research Conference, ESSDERC 2014
Country/Territory	Italy
City	Venezia Lido
Period	14/9/22 → 14/9/26

Keywords

TFET
epitaxial growth
subthreshold slope

ASJC Scopus subject areas

Electrical and Electronic Engineering
Safety, Risk, Reliability and Quality

Access to Document

10.1109/ESSDERC.2014.6948790

Cite this

Morita, Y., Mori, T., Migita, S., Mizubayashi, W., Fukuda, K., Matsukawa, T., Endo, K., O'Uchi, S., Liu, Y. X., Masahara, M., & Ota, H. (2014). Improvement of epitaxial channel quality on heavily arsenic- and boron-doped Si surfaces and impact on tunnel FET performance. In R. Bez, G. Meneghesso, & P. Pavan (Eds.), European Solid-State Device Research Conference (pp. 182-185). [6948790] (European Solid-State Device Research Conference). IEEE Computer Society. https://doi.org/10.1109/ESSDERC.2014.6948790

Improvement of epitaxial channel quality on heavily arsenic- and boron-doped Si surfaces and impact on tunnel FET performance. / Morita, Y.; Mori, T.; Migita, S.; Mizubayashi, W.; Fukuda, K.; Matsukawa, T.; Endo, K.; O'Uchi, S.; Liu, Y. X.; Masahara, M.; Ota, H.

European Solid-State Device Research Conference. ed. / Roberto Bez; Gaudenzio Meneghesso; Paolo Pavan. IEEE Computer Society, 2014. p. 182-185 6948790 (European Solid-State Device Research Conference).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Morita, Y, Mori, T, Migita, S, Mizubayashi, W, Fukuda, K, Matsukawa, T, Endo, K, O'Uchi, S, Liu, YX, Masahara, M & Ota, H 2014, Improvement of epitaxial channel quality on heavily arsenic- and boron-doped Si surfaces and impact on tunnel FET performance. in R Bez, G Meneghesso & P Pavan (eds), European Solid-State Device Research Conference., 6948790, European Solid-State Device Research Conference, IEEE Computer Society, pp. 182-185, 44th European Solid-State Device Research Conference, ESSDERC 2014, Venezia Lido, Italy, 14/9/22. https://doi.org/10.1109/ESSDERC.2014.6948790

Morita Y, Mori T, Migita S, Mizubayashi W, Fukuda K, Matsukawa T et al. Improvement of epitaxial channel quality on heavily arsenic- and boron-doped Si surfaces and impact on tunnel FET performance. In Bez R, Meneghesso G, Pavan P, editors, European Solid-State Device Research Conference. IEEE Computer Society. 2014. p. 182-185. 6948790. (European Solid-State Device Research Conference). https://doi.org/10.1109/ESSDERC.2014.6948790

Morita, Y. ; Mori, T. ; Migita, S. ; Mizubayashi, W. ; Fukuda, K. ; Matsukawa, T. ; Endo, K. ; O'Uchi, S. ; Liu, Y. X. ; Masahara, M. ; Ota, H. / Improvement of epitaxial channel quality on heavily arsenic- and boron-doped Si surfaces and impact on tunnel FET performance. European Solid-State Device Research Conference. editor / Roberto Bez ; Gaudenzio Meneghesso ; Paolo Pavan. IEEE Computer Society, 2014. pp. 182-185 (European Solid-State Device Research Conference).

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abstract = "We evaluate the impact of tunnel junction quality on the performance of tunnel field-effect transistors (TFETs). Performing a sequential surface cleaning procedure prior to epitaxial channel growth for heavily arsenic- and boron-doped Si surfaces improves the interface quality both for p- and n-TFETs. Simultaneously, the subthreshold swing (SS) values of the TFETs improve step-by-step with interface quality.",

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AU - Fukuda, K.

AU - Matsukawa, T.

AU - Endo, K.

AU - O'Uchi, S.

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AU - Ota, H.

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AB - We evaluate the impact of tunnel junction quality on the performance of tunnel field-effect transistors (TFETs). Performing a sequential surface cleaning procedure prior to epitaxial channel growth for heavily arsenic- and boron-doped Si surfaces improves the interface quality both for p- and n-TFETs. Simultaneously, the subthreshold swing (SS) values of the TFETs improve step-by-step with interface quality.

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Improvement of epitaxial channel quality on heavily arsenic- and boron-doped Si surfaces and impact on tunnel FET performance

Abstract

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Keywords

ASJC Scopus subject areas

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