Improvement of electron mobility above 100,000 cm2 V -1 s-1 in MgxZn1-xO/ZnO heterostructures

Shunsuke Akasaka, Atsushi Tsukazaki, Ken Nakahara, Akira Ohtomo, Masashi Kawasaki

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

We discuss the electron mobility (μ) of a two-dimensional electron gas (2DEG) confined at the MgxZn1-xO/ZnO heterointerface grown by molecular-beam epitaxy. With increasing x from 0.05 to 0.2, the electron density (n) was enhanced and μ was suppressed due to interface roughness or alloy disorder scattering. By the optimization of growth conditions, in particular growth rate, ionized impurity scattering in the ZnO channel could be reduced significantly. With tuning n by a gate voltage on top-gated Hall-bar devices, the peak μ at 2K was enhanced to 130,000 cm2 V -1 s-1 at n = 3 × 1011 cm-2.

Original languageEnglish
Article number080215
JournalJapanese journal of applied physics
Volume50
Issue number8 PART 1
DOIs
Publication statusPublished - 2011 Aug 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Improvement of electron mobility above 100,000 cm<sup>2</sup> V <sup>-1</sup> s<sup>-1</sup> in Mg<sub>x</sub>Zn<sub>1-x</sub>O/ZnO heterostructures'. Together they form a unique fingerprint.

  • Cite this