Improvement of AI-polar AIN layer quality by three-stage flow-modulation metalorganic chemical vapor deposition

Misaichi Takeuchi, Shin Ooishi, Takumi Ohtsuka, Tomohiro Maegawa, Takahiro Koyama, Shigefusa F. Chichibu, Yoshinobu Aoyagi

Research output: Contribution to journalArticlepeer-review

25 Citations (Scopus)

Abstract

Improvement of AI-polar AIN layer quality was accomplished by three-stage flow-modulation metalorganic chemical vapor deposition (FM-MOCVD). In this method, the unit of the FM-MOCVD sequence was composed of three stages; Stage I for simultaneous source supply, Stage II for trimethylaluminum supply, and Stage III for ammonia supply, which were cyclically repeated. The AIN quality revealed by X-ray diffraction strongly depended on the time of Stage I. A growth model was proposed considering the surface coverage of the islands nucleated during Stage I. Exciton fine structures were eventually observed by low-temperature cathodoluminescence reflecting the tremendously improved crystalline quality.

Original languageEnglish
Article number021102
JournalApplied Physics Express
Volume1
Issue number2
DOIs
Publication statusPublished - 2008 Feb

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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