Improvement in magnetoresistance of very thin permalloy films by post-annealing

Hiroshi Funaki, Satoshi Okamoto, Osamu Kitakami, Yutaka Shimada

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

We prepared Ni 80 Fe 20 films by the sputter-beam method and investigated their magnetotransport properties. The very thin film of 200 Å exhibited a high magnetoresistance of 3.5% after an appropriate post-annealing treatment. The improvement is due to the decrease of zero-field resistivity resulting from remarkable grain growth in the films. Taking into account diffusive electron scattering at the film surface, the magnetoresistance value is thought to be very close to that of the bulk.

Original languageEnglish
Pages (from-to)L1304-L1306
JournalJapanese journal of applied physics
Volume33
Issue number9
DOIs
Publication statusPublished - 1994 Jan 1

Keywords

  • Anisotropy field
  • Coercivity
  • Magnetoresistance
  • Permalloy
  • Sputter-beam method

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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