We prepared Ni80Fe20 films by the sputter-beam method and investigated their magnetotransport properties. The very thin film of 200 Å exhibited a high magnetoresistance of 3.5% after an appropriate post-annealing treatment. The improvement is due to the decrease of zero-field resistivity resulting from remarkable grain growth in the films. Taking into account diffusive electron scattering at the film surface, the magnetoresistance value is thought to be very close to that of the bulk.
|Journal||Japanese journal of applied physics|
|Publication status||Published - 1994 Sept|
- Anisotropy field
- Sputter-beam method
ASJC Scopus subject areas
- Physics and Astronomy(all)