Improved spray coating of photoresist for three-dimensional photolithography over deep structure

Vijay Kumar Singh, Minoru Sasaki, Yoshihiko Watanabe, Masato Kawakita, Hiroki Hayashi, Kazuhiro Hane

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

Spray coating of photoresist for three-dimensional (3D) photolithography over deep structures was improved. The accumulation of the photoresist at the concave corner was found as subtle. Results show that the recipe parameters are same for 100 and 200 μm deep cavaties. The resist thickness of approximately 2-4 and 1.5-3.5 μm were obtained over the whole cavity area having the 100 and 200 μm deep cavaties, respectively.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2004
Pages306-307
Number of pages2
Publication statusPublished - 2004 Dec 1
Event2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan
Duration: 2004 Oct 262004 Oct 29

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2004

Other

Other2004 International Microprocesses and Nanotechnology Conference
CountryJapan
CityOsaka
Period04/10/2604/10/29

ASJC Scopus subject areas

  • Engineering(all)

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