Improved RF integrated magnetic thin-film inductors by means of micro slits and surface planarization techniques

M. Yamaguchi, M. Baba, K. Suezawa, T. Moizumi, K. I. Arai, A. Haga, Y. Shimada, S. Tanabe, K. Itoh

Research output: Contribution to journalConference articlepeer-review

36 Citations (Scopus)

Abstract

Improvement of magnetic thin-film inductors for RF monolithic microwave integrated circuits (MMIC's) is discussed. Surface planarization reduced the surface roughness down to R a = 1.2 nm, which enhanced the quality factor by 14% over a nonplanarized inductor. The orthogonal bar slit pattern was the best among the fabricated slit patterns. L = 7.55 nH (+12% of the air core), R = 6.80 Ω and Q = 7.09 (+9%) were obtained for the orthogonal bar slit pattern (slit width = 0.75 μm) with surface planarization.

Original languageEnglish
Pages (from-to)3495-3498
Number of pages4
JournalIEEE Transactions on Magnetics
Volume36
Issue number5 I
DOIs
Publication statusPublished - 2000 Sep
Event2000 International Magnetics Conference (INTERMAG 2000) - Toronto, Ont, Canada
Duration: 2000 Apr 92000 Apr 12

Keywords

  • Complex permeability
  • Inductance
  • Microfabrication
  • Planarization
  • Quality factor
  • RF integrated inductor

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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