Improved performance of solution-processed a-InGaZnO thin-film transistors due to Ar/O2 mixed-plasma treatment

Kwan Soo Kim, Yeong Hyeon Hwang, Inchan Hwang, Won Ju Cho

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

We investigated the effects of Ar and O2 treatment and of Ar/O2 mixedplasma treatment on the electrical characteristics of solution-processed amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistors (TFTs). The electrical performance and the instability of a-IGZO TFTs were significantly improved by the plasma treatments. The plasma treatments reduced the carbon-based residual contamination that acted as possible trap sites. In particular, the O2-plasma treatment produced a significant improvement in the reliability of a-IGZO TFTs when compared with the Ar-plasma-treated device, owing to the elimination of residual carbon in the active channel of the solution-processed a-IGZO. However, the optimized improvement of the solution-processed a-IGZO TFT under a gate bias stress was obtained for the device treated with an Ar/O2 mixed-gas plasma. The plasma treatment in the Ar/O2-mixed ambience remarkably enhanced not only the reliability but also the electrical performance of the a-IGZO TFT; the on/off-current ratio, the field-effect mobility, and the subthreshold slope were 6.78 × 107, 1.24 cm2/V·s, and 513 mV/dec, respectively.

Original languageEnglish
Pages (from-to)399-403
Number of pages5
JournalJournal of the Korean Physical Society
Volume65
Issue number3
DOIs
Publication statusPublished - 2014 Aug

Keywords

  • Oxide TFT
  • Residual carbon
  • Solution-process

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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