Impact of hydrochloric acid on the epitaxial growth of In2O3films on (0001)α-Al2O3substrates by mist CVD

Tomohiro Yamaguchi; Subaru Takahashi; Takanori Kiguchi; Atsushi Sekiguchi; Kentaro Kaneko; Shizuo Fujita; Hiroki Nagai; Mitsunobu Sato; Takeyoshi Onuma; Tohru Honda

doi:10.35848/1882-0786/ab9a90

Impact of hydrochloric acid on the epitaxial growth of In₂O₃films on (0001)α-Al₂O₃substrates by mist CVD

Tomohiro Yamaguchi, Subaru Takahashi, Takanori Kiguchi, Atsushi Sekiguchi, Kentaro Kaneko, Shizuo Fujita, Hiroki Nagai, Mitsunobu Sato, Takeyoshi Onuma, Tohru Honda

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

In2O3 films were epitaxially grown on (0001)α-Al2O3 substrates by mist CVD, and the impact of hydrochloric acid (HCl) was investigated by varying the HCl concentration in the source solution. Single-phase rhombohedral corundum-type In2O3 films, without the incorporation of body-centered cubic bixbite-type In2O3 phases, could be successfully grown directly on α-Al2O3 substrates by controlling only the HCl concentration. In growth by mist CVD, adding HCl to the source solution was found to affect not only the dissolution of the source precursor but also the growth kinetics of phase control, surface migration and impurity incorporation.

Original language	English
Article number	075504
Journal	Applied Physics Express
Volume	13
Issue number	7
DOIs	https://doi.org/10.35848/1882-0786/ab9a90
Publication status	Published - 2020 Jul 1
Externally published	Yes

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.35848/1882-0786/ab9a90

Cite this

Impact of hydrochloric acid on the epitaxial growth of In₂O₃films on (0001)α-Al₂O₃substrates by mist CVD. / Yamaguchi, Tomohiro; Takahashi, Subaru; Kiguchi, Takanori; Sekiguchi, Atsushi; Kaneko, Kentaro; Fujita, Shizuo; Nagai, Hiroki; Sato, Mitsunobu; Onuma, Takeyoshi; Honda, Tohru.

In: Applied Physics Express, Vol. 13, No. 7, 075504, 01.07.2020.

Research output: Contribution to journal › Article › peer-review

@article{dab2d20da5d14367bde999e1d455f40b,

title = "Impact of hydrochloric acid on the epitaxial growth of In2O3films on (0001)α-Al2O3substrates by mist CVD",

abstract = "In2O3 films were epitaxially grown on (0001)α-Al2O3 substrates by mist CVD, and the impact of hydrochloric acid (HCl) was investigated by varying the HCl concentration in the source solution. Single-phase rhombohedral corundum-type In2O3 films, without the incorporation of body-centered cubic bixbite-type In2O3 phases, could be successfully grown directly on α-Al2O3 substrates by controlling only the HCl concentration. In growth by mist CVD, adding HCl to the source solution was found to affect not only the dissolution of the source precursor but also the growth kinetics of phase control, surface migration and impurity incorporation.",

author = "Tomohiro Yamaguchi and Subaru Takahashi and Takanori Kiguchi and Atsushi Sekiguchi and Kentaro Kaneko and Shizuo Fujita and Hiroki Nagai and Mitsunobu Sato and Takeyoshi Onuma and Tohru Honda",

note = "Publisher Copyright: {\textcopyright} 2020 The Japan Society of Applied Physics.",

year = "2020",

month = jul,

day = "1",

doi = "10.35848/1882-0786/ab9a90",

language = "English",

volume = "13",

journal = "Applied Physics Express",

issn = "1882-0778",

publisher = "Japan Society of Applied Physics",

number = "7",

}

TY - JOUR

T1 - Impact of hydrochloric acid on the epitaxial growth of In2O3films on (0001)α-Al2O3substrates by mist CVD

AU - Yamaguchi, Tomohiro

AU - Takahashi, Subaru

AU - Kiguchi, Takanori

AU - Sekiguchi, Atsushi

AU - Kaneko, Kentaro

AU - Fujita, Shizuo

AU - Nagai, Hiroki

AU - Sato, Mitsunobu

AU - Onuma, Takeyoshi

AU - Honda, Tohru

PY - 2020/7/1

Y1 - 2020/7/1

N2 - In2O3 films were epitaxially grown on (0001)α-Al2O3 substrates by mist CVD, and the impact of hydrochloric acid (HCl) was investigated by varying the HCl concentration in the source solution. Single-phase rhombohedral corundum-type In2O3 films, without the incorporation of body-centered cubic bixbite-type In2O3 phases, could be successfully grown directly on α-Al2O3 substrates by controlling only the HCl concentration. In growth by mist CVD, adding HCl to the source solution was found to affect not only the dissolution of the source precursor but also the growth kinetics of phase control, surface migration and impurity incorporation.

AB - In2O3 films were epitaxially grown on (0001)α-Al2O3 substrates by mist CVD, and the impact of hydrochloric acid (HCl) was investigated by varying the HCl concentration in the source solution. Single-phase rhombohedral corundum-type In2O3 films, without the incorporation of body-centered cubic bixbite-type In2O3 phases, could be successfully grown directly on α-Al2O3 substrates by controlling only the HCl concentration. In growth by mist CVD, adding HCl to the source solution was found to affect not only the dissolution of the source precursor but also the growth kinetics of phase control, surface migration and impurity incorporation.

UR - http://www.scopus.com/inward/record.url?scp=85091398744&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85091398744&partnerID=8YFLogxK

U2 - 10.35848/1882-0786/ab9a90

DO - 10.35848/1882-0786/ab9a90

M3 - Article

AN - SCOPUS:85091398744

VL - 13

JO - Applied Physics Express

JF - Applied Physics Express

SN - 1882-0778

IS - 7

M1 - 075504

ER -

Impact of hydrochloric acid on the epitaxial growth of In₂O₃films on (0001)α-Al₂O₃substrates by mist CVD

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this