Impact of hydrochloric acid on the epitaxial growth of In2O3films on (0001)α-Al2O3substrates by mist CVD

Tomohiro Yamaguchi, Subaru Takahashi, Takanori Kiguchi, Atsushi Sekiguchi, Kentaro Kaneko, Shizuo Fujita, Hiroki Nagai, Mitsunobu Sato, Takeyoshi Onuma, Tohru Honda

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1 Citation (Scopus)

Abstract

In2O3 films were epitaxially grown on (0001)α-Al2O3 substrates by mist CVD, and the impact of hydrochloric acid (HCl) was investigated by varying the HCl concentration in the source solution. Single-phase rhombohedral corundum-type In2O3 films, without the incorporation of body-centered cubic bixbite-type In2O3 phases, could be successfully grown directly on α-Al2O3 substrates by controlling only the HCl concentration. In growth by mist CVD, adding HCl to the source solution was found to affect not only the dissolution of the source precursor but also the growth kinetics of phase control, surface migration and impurity incorporation.

Original languageEnglish
Article number075504
JournalApplied Physics Express
Volume13
Issue number7
DOIs
Publication statusPublished - 2020 Jul 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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