Hydroxyl-induced wetting of metals by water at near-ambient conditions

Susumu Yamamoto, Klas Andersson, Hendrik Bluhm, Guido Ketteler, David E. Starr, Theanne Schiros, Hirohito Ogasawara, Lars G.M. Pettersson, Miquel Salmeron, Anders Nilsson

Research output: Contribution to journalArticlepeer-review

117 Citations (Scopus)

Abstract

We report different wetting properties of Cu(110) and Cu(111) at near-ambient conditions using in situ photoemission spectroscopy. At near-ambient conditions of pressure (1 Torr) and temperature (295 K), the Cu( 110) surface is covered with a mixed OH and H2O layer, whereas the Cu(111) surface remains clean and adsorbate-free. We show that wetting is controlled by the presence of OH groups on the surface, acting as anchors for water adsorption. Hydroxylation of the Cu(110) surface is facilitated by a lower activation barrier for water dissociation compared to Cu(111).

Original languageEnglish
Pages (from-to)7848-7850
Number of pages3
JournalJournal of Physical Chemistry C
Volume111
Issue number22
DOIs
Publication statusPublished - 2007 Jun 7
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

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