Hydroxyapatite formation on MOCVD-CaTiO3 coated Ti

Mitsutaka Sato; Rong Tu; Takashi Goto; Kyosuke Ueda; Takayuki Narushima

doi:10.4028/0-87849-454-5.301

Hydroxyapatite formation on MOCVD-CaTiO₃ coated Ti

Mitsutaka Sato, Rong Tu, Takashi Goto, Kyosuke Ueda, Takayuki Narushima

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Ca-Ti-O films were prepared by MOCVD using Ca(dpm)₂ and Ti(OiPr)₂(dpm)₂ precursors. The phases, composition and morphology of Ca-Ti-O films changed depending on the molar ratio of Ca to Ti precursors (R_Ca/Ti), total pressure (P_tot) and substrate temperature (T_sub). CaTiO₃ films in a single phase were obtained at T_sub = 973 and 1073 K. CaTiO₃ films prepared at 873 K had a dense structure and smooth surface. CaTiO₃ films prepared at T_sub = 1073 K had complicated rough surface with a cauliflower-like texture. Hydroxyapatite (HAp) formed in 3 days on the CaTiO₃ film prepared at T_sub = 1073 K.

Original language	English
Pages (from-to)	301-304
Number of pages	4
Journal	Key Engineering Materials
Volume	352
DOIs	https://doi.org/10.4028/0-87849-454-5.301
Publication status	Published - 2007 Jan 1

Keywords

Calcium titanate
Hanks' solution
Hydroxyapatite
Metal-organic chemical vapor deposition

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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title = "Hydroxyapatite formation on MOCVD-CaTiO3 coated Ti",

abstract = "Ca-Ti-O films were prepared by MOCVD using Ca(dpm)2 and Ti(OiPr)2(dpm)2 precursors. The phases, composition and morphology of Ca-Ti-O films changed depending on the molar ratio of Ca to Ti precursors (RCa/Ti), total pressure (Ptot) and substrate temperature (Tsub). CaTiO3 films in a single phase were obtained at Tsub = 973 and 1073 K. CaTiO3 films prepared at 873 K had a dense structure and smooth surface. CaTiO3 films prepared at Tsub = 1073 K had complicated rough surface with a cauliflower-like texture. Hydroxyapatite (HAp) formed in 3 days on the CaTiO3 film prepared at Tsub = 1073 K.",

keywords = "Calcium titanate, Hanks' solution, Hydroxyapatite, Metal-organic chemical vapor deposition",

author = "Mitsutaka Sato and Rong Tu and Takashi Goto and Kyosuke Ueda and Takayuki Narushima",

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AU - Sato, Mitsutaka

AU - Tu, Rong

AU - Goto, Takashi

AU - Ueda, Kyosuke

AU - Narushima, Takayuki

PY - 2007/1/1

Y1 - 2007/1/1

N2 - Ca-Ti-O films were prepared by MOCVD using Ca(dpm)2 and Ti(OiPr)2(dpm)2 precursors. The phases, composition and morphology of Ca-Ti-O films changed depending on the molar ratio of Ca to Ti precursors (RCa/Ti), total pressure (Ptot) and substrate temperature (Tsub). CaTiO3 films in a single phase were obtained at Tsub = 973 and 1073 K. CaTiO3 films prepared at 873 K had a dense structure and smooth surface. CaTiO3 films prepared at Tsub = 1073 K had complicated rough surface with a cauliflower-like texture. Hydroxyapatite (HAp) formed in 3 days on the CaTiO3 film prepared at Tsub = 1073 K.

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KW - Calcium titanate

KW - Hanks' solution

KW - Hydroxyapatite

KW - Metal-organic chemical vapor deposition

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