Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature

M. Shimozuma, G. Tochitani, H. Ohno, H. Tagashira, J. Nakahara

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

Hydrogenated amorphous carbon (a-C:H) films were prepared at room temperature by low-frequency (50-Hz) plasma chemical vapor deposition using CH4 and H2. The a-C:H films were transparent, highly resistive, and very uniform. Infrared absorption measurements, as well as Raman spectroscopy, indicated that the C bonding in the a-C:H films was predominantly sp3. Moreover, the optical band gap of the a-C:H films was measured.

Original languageEnglish
Pages (from-to)447-449
Number of pages3
JournalJournal of Applied Physics
Volume66
Issue number1
DOIs
Publication statusPublished - 1989 Dec 1
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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