Hydrogen termination of the NH4F treated Si(111) surface studied by photoemission and surface infrared spectroscopy

Michio Niwano, Kazunari Kurita, Nobuo Miyamoto

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The Si(111) surface treated in NH4F has been investigated using photoemission and surface infrared spectroscopy (SIS). We confirm both with photoemission and SIS measurements that the NH4F-treated Si(111) surface is dominantly terminated with the monohydride Si (Si-H) oriented perpendicular to the surface and is free from silicon oxide. Photoemission and SIS data also demonstrate that ammonium fluorides react with the Si substrate to generate the hexafluorosilicate salt, (NH4)2SiF6. We propose that the formation of (NH4)2SiF6 or SiF62- ions plays an important role in the NH4F etching of Si crystals.

Original languageEnglish
Title of host publicationSurface Chemical Cleaning and Passivation for Semiconductor Processing
EditorsGregg S. Higashi, Eugene A. Irene, Tadahiro Ohmi
PublisherPubl by Materials Research Society
Pages505-510
Number of pages6
ISBN (Print)1558992138
Publication statusPublished - 1993 Dec 1
EventProceedings of the 1993 Spring Meeting of the Materials Research Society - San Francisco, CA, USA
Duration: 1993 Apr 131993 Apr 15

Publication series

NameMaterials Research Society Symposium Proceedings
Volume315
ISSN (Print)0272-9172

Other

OtherProceedings of the 1993 Spring Meeting of the Materials Research Society
CitySan Francisco, CA, USA
Period93/4/1393/4/15

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Hydrogen termination of the NH<sub>4</sub>F treated Si(111) surface studied by photoemission and surface infrared spectroscopy'. Together they form a unique fingerprint.

Cite this