Hybrid model simulation of the cluster deposition process

Kenta Hongo, Hiroshi Mizuseki, Yoshiyuki Kawazoe, Luc T. Wille

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

We propose a hybrid model to simulate the cluster deposition process. This model consists of the direct simulation Monte Carlo and Monte Carlo methods that combine the macro with the nano scale. We investigate the effects of certain experimental parameters in cluster-formation process on the film morphology, including packing density. The model reveals that the morphology is strongly affected by the size distribution of the incident clusters. These results indicate the possibility of designing unique thin-film structures and properties.

Original languageEnglish
Pages (from-to)429-433
Number of pages5
JournalJournal of Crystal Growth
Volume236
Issue number1-3
DOIs
Publication statusPublished - 2002 Mar 1

Keywords

  • A1. Nanostructures
  • A3. Physical vapor deposition processes
  • B1. Nanomaterials

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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