Hot filament CVD diamond coating of TiC sliders

S. Konoplyuk, T. Abe, T. Takagi, T. Uchimoto

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

Hot filament chemical vapour deposition (HF CVD) process with low filament temperature (∼ 1650 °C) was utilized for the diamond coating of TiC samples. Porous substrates were fabricated by pulse discharge sintering (PDS) to create more nucleation sites. Nucleation density and morphology of deposited diamond films were studied using scanning electron microscopy (SEM). It was found that the highest growth rate occurs at substrate temperature of 980 °C. Evaluation of the residual stress in deposited films was carried out by Raman spectroscopy. Ball on disk tests were performed with steel as a counterface material. After polishing diamond films demonstrated good sliding performance: friction coefficient of 0.08 and wear rate of 10- 17 m3/N m.

Original languageEnglish
Pages (from-to)609-615
Number of pages7
JournalDiamond and Related Materials
Volume16
Issue number3
DOIs
Publication statusPublished - 2007 Mar

Keywords

  • Diamond film
  • Porous TiC substrate
  • Pulse discharge sintering
  • Wear and friction

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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