The density of hetero-interface-traps in a SiGe/Si heterostructure is successfully measured using a newly established charge pumping technique in a SiGe-channel pMOSFET, without interference from the gate oxide interface traps, and a good correlation between the measured density of hetero-interface-traps and the low frequency noise level in drain current flowing in the SiGe-channel is obtained. Moreover, it is experimentally shown that hot carrier degradation occurs in the SiGc/Si heterostructure, and the density of traps generated is estimated using the new charge pumping technique. These results will enable new levels of improvement to the performance and reliability of strained-Si and SiGe devices.
|Number of pages||5|
|Publication status||Published - 2004|
|Event||2004 7th International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT 2004 - Beijing, China|
Duration: 2004 Oct 18 → 2004 Oct 21
|Other||2004 7th International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT 2004|
|Period||04/10/18 → 04/10/21|
ASJC Scopus subject areas