TY - JOUR
T1 - Homogeneous TiO2-SiO2 ultralow-expansion glass for extreme ultraviolet lithography evaluated by the line-focus-beam ultrasonic material characterization system
AU - Kushibiki, Jun Ichi
AU - Arakawa, Mototaka
AU - Ueda, Tetsuji
AU - Fujinoki, Akira
PY - 2008/8/1
Y1 - 2008/8/1
N2 - A TiO2-SiO2 glass ingot was fabricated by the soot method and homogenized by the zone-melting method. Elastic homogeneities of specimens prepared at different production stages were evaluated by measuring leaky surface acoustic wave (LSAW) velocity VLSAW using the line-focus-beam ultrasonic material-characterization system at 225MHz. The homogeneous VLSAw distribution was within ±1.13m/s, corresponding to a variation of the coefficient of thermal expansion (CTE) of ±5 ppb/K, and no striae were observed. VLSAW changes associated with residual stress inside the ingot could be detected. The relationships among V LSAW, TiO2 concentration, density, CTE characteristics, and fictive temperature were investigated. We found the possibility for extremely homogeneous TiO2-SiO2 glass with zero-crossing in CTE at a desired room temperature.
AB - A TiO2-SiO2 glass ingot was fabricated by the soot method and homogenized by the zone-melting method. Elastic homogeneities of specimens prepared at different production stages were evaluated by measuring leaky surface acoustic wave (LSAW) velocity VLSAW using the line-focus-beam ultrasonic material-characterization system at 225MHz. The homogeneous VLSAw distribution was within ±1.13m/s, corresponding to a variation of the coefficient of thermal expansion (CTE) of ±5 ppb/K, and no striae were observed. VLSAW changes associated with residual stress inside the ingot could be detected. The relationships among V LSAW, TiO2 concentration, density, CTE characteristics, and fictive temperature were investigated. We found the possibility for extremely homogeneous TiO2-SiO2 glass with zero-crossing in CTE at a desired room temperature.
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U2 - 10.1143/APEX.1.087002
DO - 10.1143/APEX.1.087002
M3 - Article
AN - SCOPUS:57649084576
SN - 1882-0778
VL - 1
SP - 870021
EP - 870023
JO - Applied Physics Express
JF - Applied Physics Express
IS - 8
ER -