Highly angle-resolved X-ray photoelectron diffraction from solid surfaces

K. Tamura, S. Shiraki, H. Ishii, M. Owari, Y. Nihei

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    We have carried out the highly angle-resolved X-ray photoelectron diffraction (XPED) measurements by using the input-lens system for restriction of the detection angle. In the input-lens system, high angular resolution and high throughput are accomplished by placing an aperture not on the image plane but on the diffraction plane of electron optics. The aperture sizes (φ4 mm, φ2 mm, φ0.5 mm, φ0.25 mm) correspond to the angular resolutions (±0.6°, ±0.3°, ±0.08°, ±0.04°) respectively. Highly angle-resolved Ge3d XPED patterns from Ge(111) obtained by the angle-resolving system contain fine structure such as Kikuchi patterns. The fine structure was reproduced by multiple scattering cluster calculations.

    Original languageEnglish
    Pages (from-to)257-261
    Number of pages5
    JournalSurface Review and Letters
    Volume10
    Issue number2-3
    DOIs
    Publication statusPublished - 2003 Jan 1

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

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