Highly (100)-oriented CeO2 films prepared on amorphous substrates by laser chemical vapor deposition

J. R. Vargas-Garcia, L. Beltran-Romero, R. Tu, T. Goto

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)


CeO2 films were prepared on amorphous silica substrates by laser chemical vapor deposition using cerium dipivaloylmethanate precursor and a semiconductor InGaAlAs (808 nm in wavelength) laser system. The laser spot size was about 20 mm, which was sufficient to cover the whole substrate. Highly (100)-oriented CeO2 films were obtained at extraordinary high deposition rates ranging from 60 to 132 μm/h. Films exhibited a columnar feather-like structure with a large number of nano-sized voids, and a surface morphology consisting of either nearly flat or pyramidal top-ending columns depending on the laser power. Nearly flat top-ending columns could be fairly (100)-oriented at the top and (111)-oriented laterally.

Original languageEnglish
Pages (from-to)1-4
Number of pages4
JournalThin Solid Films
Issue number1
Publication statusPublished - 2010 Oct 29


  • Cerium oxide
  • Laser chemical vapor deposition
  • Oriented films
  • Transmission electron microscopy
  • X-ray diffraction

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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