Highly (001)-oriented α-Al2O3 films prepared by laser chemical vapor deposition

Yu You, Akihiko Ito, Takashi Goto

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

(001)-oriented α-Al2O3 films were prepared on polycrystalline AlN substrates by laser chemical vapor deposition at deposition temperatures of 1373-1455 K. The (001) orientation degree increased from 36% to 90% with increasing vaporization temperature of the Al precursor from 438 to 453 K; the deposition rate also increased from 82 to 175 μm h-1. The (001)-oriented α-Al2O3 films exhibited columnar growth, and hexagonal terraces of α-Al2O3 (001) plane were observed on the surface.

Original languageEnglish
Pages (from-to)11-13
Number of pages3
JournalMaterials Letters
Volume106
DOIs
Publication statusPublished - 2013 May 29

Keywords

  • Laser CVD
  • Microstructure
  • Oriented growth
  • α-AlO

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

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