Higher order nonlinear dielectric microscopy

Yasuo Cho; Koya Ohara

Higher order nonlinear dielectric microscopy

Yasuo Cho, Koya Ohara

Information Devices Division

Research output: Contribution to journal › Conference article › peer-review

Abstract

A higher order nonlinear dielectric microscopy technique with higher lateral and depth resolution that conventional nonlinear dielectric imaging is investigated. The proposed technique involves the measurement of higher order nonlinear dielectric constants, with a depth resolution of down to 1.5 nm. The technique is demonstrated to be very useful for observing surface layers of the order of unit cell thickness on ferroelectric materials.

Original language	English
Pages (from-to)	329-334
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	688
Publication status	Published - 2002 Jan 1
Event	Ferroelectric Thin Films X - Boston, MA, United States Duration: 2001 Nov 25 → 2001 Nov 29

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Cite this

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title = "Higher order nonlinear dielectric microscopy",

abstract = "A higher order nonlinear dielectric microscopy technique with higher lateral and depth resolution that conventional nonlinear dielectric imaging is investigated. The proposed technique involves the measurement of higher order nonlinear dielectric constants, with a depth resolution of down to 1.5 nm. The technique is demonstrated to be very useful for observing surface layers of the order of unit cell thickness on ferroelectric materials.",

author = "Yasuo Cho and Koya Ohara",

year = "2002",

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language = "English",

volume = "688",

pages = "329--334",

journal = "Materials Research Society Symposium - Proceedings",

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publisher = "Materials Research Society",

note = "Ferroelectric Thin Films X ; Conference date: 25-11-2001 Through 29-11-2001",

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T1 - Higher order nonlinear dielectric microscopy

AU - Cho, Yasuo

AU - Ohara, Koya

PY - 2002/1/1

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N2 - A higher order nonlinear dielectric microscopy technique with higher lateral and depth resolution that conventional nonlinear dielectric imaging is investigated. The proposed technique involves the measurement of higher order nonlinear dielectric constants, with a depth resolution of down to 1.5 nm. The technique is demonstrated to be very useful for observing surface layers of the order of unit cell thickness on ferroelectric materials.

AB - A higher order nonlinear dielectric microscopy technique with higher lateral and depth resolution that conventional nonlinear dielectric imaging is investigated. The proposed technique involves the measurement of higher order nonlinear dielectric constants, with a depth resolution of down to 1.5 nm. The technique is demonstrated to be very useful for observing surface layers of the order of unit cell thickness on ferroelectric materials.

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M3 - Conference article

AN - SCOPUS:0036350170

VL - 688

SP - 329

EP - 334

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

SN - 0272-9172

T2 - Ferroelectric Thin Films X

Y2 - 25 November 2001 through 29 November 2001

ER -

Higher order nonlinear dielectric microscopy

Abstract

ASJC Scopus subject areas

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