Abstract
A higher order nonlinear dielectric microscopy technique with higher lateral and depth resolution that conventional nonlinear dielectric imaging is investigated. The proposed technique involves the measurement of higher order nonlinear dielectric constants, with a depth resolution of down to 1.5 nm. The technique is demonstrated to be very useful for observing surface layers of the order of unit cell thickness on ferroelectric materials.
Original language | English |
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Pages (from-to) | 329-334 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 688 |
Publication status | Published - 2002 Jan 1 |
Event | Ferroelectric Thin Films X - Boston, MA, United States Duration: 2001 Nov 25 → 2001 Nov 29 |
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering